The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 1992
Filed:
Aug. 30, 1990
Eiichi Miyamoto, Osaka, JP;
Nariaki Mutou, Osaka, JP;
Tooru Nakazawa, Osaka, JP;
Tatsuo Maeda, Nishinomiya, JP;
Mita Industrial Co., Ltd., Osaka, JP;
Abstract
A stable .alpha.-type titanyl phthalocyanine composition including an .alpha.-type titanyl phthalocyanine and a metal-free phthalocyanine is disclosed having a wide range of absorption wavelengths and high in spectral sensitivity. The method for making the phthalocyanine composition is carried out by pigmenting a concentrated sulfuric acid solution containing at least titanyl phthalocyanine by an acid paste process. The concentrated sulfuric acid solution is poured into water to produce an .alpha.-type titanyl phthalocyanine composition which is stable to withstand the impact of aging. Also disclosed is an electrophotographic sensitive material which includes a sensitive layer having the .alpha.-type titanyl phthalocyanine composition superposed on an electroconductive substrate. This electrophotographic sensitive material excels in its charging property and its dark attenuation property and exhibits high sensitivity and low residual potential. The electrophotographic sensitive material having a sensitive layer comprising the .alpha.-type titanyl phthalocyanine composition and an electric charge transferring material can also be superposed on an electroconductive substrate. This electrophotographic photosensitive material exhibits an oxidation potential in the ranage of 0.45 to 0.65 eV, enjoys high sensitivity, and shows low residual potential.