The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 1992

Filed:

Jan. 25, 1991
Applicant:
Inventor:

Norihiko Kotani, Itami, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ; G05B / ;
U.S. Cl.
CPC ...
364468 ; 364149 ; 364578 ;
Abstract

A system for managing successive processes which are to be performed on a semiconductor wafer in a production line for producing a semiconductor device. The system comprises a process managing block for receiving data on preceding processes which have already been performed on the semiconductor wafer on the production line and delivers conditions for the processes which are to be subsequently performed on the production line, a data accumulation block for statistically accumulating data concerning preceding processes carried out on the production line, and a simulation block for determining optimum conditions for the processes which are to be subsequently performed based on the data concerning the preceding processes which have been actually performed on the production line and the statistical data accumulated on the data accumulation block. The simulation block provides optimum process conditions to the process managing block. Any deviation of the characteristics of the unfinished product caused by preceding processes are compensated for by appropriately varying the conditions of the subsequent processes whereby semiconductor products of high quality are produced with a high yield.


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