The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1992
Filed:
May. 16, 1989
Martinus P Bierhoff, Eindhoven, NL;
Job F van Mil, Eindhoven, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
A focus control system for optical record carrier scanning apparatus includes a mechanical actuator (13) for moving the focus of the scanning beam relative to a recording layer of the record carrier, a focus-error detection circuit (15, 16, 17) for generating a focus-error signal (FE), and a control circuit (26) for generating a first control signal (AS') for the actuator (13) which is proportional to the focus-error signal (FE). In order to ensure that the actuator is within its generating range when it locks-in to the focus-error signal, the system also includes a lock-in circuit (20) having a signal generator (21) and an integrator (23) for generating an additional control signal (AS') for the actuator (13) prior to lock-in. A lock-in detection circuit (25) generates a lock-in signal (IN FOCUS) when the focus error is in the operation range, which causes a switch (22) to change-over the input to integrator (23) to the focus-error signal (FE) and also enables the control circuit (26) to provide the first control signal (AS'). Thus, after lock-in the integrator (23) and the control circuit (26) constitute a controller for controlling actuator (13) in accordance with both the focus-error signal and the integral thereof. This compensates for low-frequency disturbances and renders the control system more immune to variations in the parameters affecting correct beam focus position.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile