The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 1992

Filed:

May. 23, 1990
Applicant:
Inventors:

Visweswara R Durvasula, Lake Jackson, TX (US);

Franz J Luxem, Clute, TX (US);

Assignee:

The Dow Chemical Company, Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
560189 ; 568865 ; 560198 ;
Abstract

Polyethers having terminal allyl unsaturation are subject to hydrogenolysis by reaction with a hydrogen donor in the presence of a n-allyl complex forming catalyst. The product polyethers have extremely low levels of unsaturation, and thus are useful in preparing polyurethanes having improved properties and processing.


Find Patent Forward Citations

Durvasula, Visweswara. (1992). Method for reducing unsaturation of polyethers (U.S. Patent No. 5103042). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5103042

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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