The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1992
Filed:
Oct. 11, 1988
Tomoo Yamamoto, Tokyo, JP;
Shigeki Yagi, Tokyo, JP;
Munechika Sakabe, Tokyo, JP;
Osamu Segawa, Tokyo, JP;
Kiyoshi Kobayashi, Tokyo, JP;
Seiko Instruments, Inc., Tokyo, JP;
Abstract
An automatic infinitesimal liquid reactor equipped with a pipetter for dispensing reagents employs two stages which are capable of sliding horizontally. A microplate which has a plurality of recesses in rows is placed in one stage and reagent bottles are placed on the other stage. The pipetter is supported on a horizontal guide rail operating slidably horizontally and along an axis perpendicular to the direction in which the two stages slide. The horizontal guide rail is supported on a vertical guide rail so as to operate slidably in a vertical direction. Thus the pipetter can be moved in a plane perpendicular to the direction in which the two stages slide. When reagents are sucked from reagent bottles, the second stage is slid so that a reagent bottle is superposed below the pipetter and the pipetter is moved downwardly into the reagent bottle to draw in a reagent. When the reagent is discharged, the first stage is slid so that the microplate is superposed below the pipetter and the pipetter is moved downwardly into a recess to discharge the reagent, thereby dispensing a reagent efficiently and minimizing the space required for the reactor.