logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5102523 B1

PDFFull Text
Date of Patent:
Apr. 07, 1992

Filed:

Oct. 25, 1990

Arrangement for the production of a plasma

Applicant:
Inventors:

Siegfried Beisswenger, Alzenau, DE;

Barbara Beichler, Rodgau, DE;

Michael Geisler, Wachtersbach, DE;

Stefan Reineck, Langgons, DE;

Assignee:

Leybold Aktiengesellschaft, Hanau I, DE;

Attorney:

Felfe & Lynch

Primary Examiner:

Aaron Weisstuch

Int. Cl.
CPC ...
H01H / ; C23F / ;
U.S. Cl.
CPC ...
20429833 ; 20429831 ; 20429834 ; 118723 ; 156345 ;
Abstract

The invention relates to an arrangement for the production of a plasma as well as for applying charged and uncharged particles onto a substrate. Two areal electrodes connected to a voltage source are provided between which a plasma volume excited by high-frequency energy is ignited. The areal ratio of the two electrodes is variable in order to influence the energy of the ions impinging on a substrate. Furthermore, supplying of process gas distributed over the entire substrate area is possible.

Find Patent Forward Citations

Beisswenger, Siegfried. (1992). Arrangement for the production of a plasma (U.S. Patent No. 5102523). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5102523

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…