The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1992
Filed:
Oct. 25, 1990
Applicant:
Inventors:
Siegfried Beisswenger, Alzenau, DE;
Barbara Beichler, Rodgau, DE;
Michael Geisler, Wachtersbach, DE;
Stefan Reineck, Langgons, DE;
Assignee:
Leybold Aktiengesellschaft, Hanau I, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01H / ; C23F / ;
U.S. Cl.
CPC ...
20429833 ; 20429831 ; 20429834 ; 118723 ; 156345 ;
Abstract
The invention relates to an arrangement for the production of a plasma as well as for applying charged and uncharged particles onto a substrate. Two areal electrodes connected to a voltage source are provided between which a plasma volume excited by high-frequency energy is ignited. The areal ratio of the two electrodes is variable in order to influence the energy of the ions impinging on a substrate. Furthermore, supplying of process gas distributed over the entire substrate area is possible.