The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 1992
Filed:
Dec. 06, 1990
Henry Shaw, Vleteren, BE;
Abstract
A weaving machine including a device for stretching a fabric in the weaving machine includes a guide bar over which the fabric is bent to thereby bring a surface of the fabric into contact with the guide bar. An array of notches on each end of the guide bar is provided to exert an outward traction on the fabric edges to maintain the fabric in stretched condition. To enable a fabric whose width is narrower than a full weaving width to be located along the guide bar in a non-symmetrical manner while effecting a lateral traction force on the edges of the fabric; the guide bar is provided with at least one array of notches located at one end of the bar arranged so that each notch in the array is broken so as to extend circumferentially less than the full circumference of the guide bar, with the array including a plurality of notches longitudinally and circumferentially spaced along the guide bar. An arrangement is provided to set the notches of the array at a selected one of a plurality of angular positions by rotary movement of the array or the guide bar to thereby define a zone with which the fabric comes into contact at varying distances from the one end of the guide bar, depending upon the rotary position of the guide bar or the array. The array may be disposed helicoidally over the circumference of the guide bar or maybe arranged stepwise along the guide bar length.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile