The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 1992

Filed:

Jan. 11, 1991
Applicant:
Inventors:

Robert L Snyder, Alfred, NY (US);

Allen M Hermann, Golden, CO (US);

Xingwu Wang, Alfred, NY (US);

Hongmin Duan, Boulder, CO (US);

Jemmy Hao, Alfred, NY (US);

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; B05D / ; B05D / ; C23C / ;
U.S. Cl.
CPC ...
505-1 ; 505730 ; 505737 ; 505742 ; 427 34 ; 427 62 ; 427226 ; 427314 ; 427377 ; 427421 ; 427 451 ;
Abstract

A two-step process for the preparation of a thallium-containing superconductive film is described. In the first step of this process, an aerosol mist containing reactants necessary to produce a calcium/barium/strontium/copper precursor material is provided. This mist is subjected to radio-frequency radiation while in the plasma region, and it thereafter is deposited onto an electrically grounded substrate. In the second step of the process, the coated substrate is contacted with thallium-containing vapor.


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