The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1992
Filed:
Dec. 26, 1989
Applicant:
Inventors:
Bradley A Paulson, Ames, IA (US);
Allen R Landin, Ames, IA (US);
Assignee:
Iowa State University Research Foundation, Inc., Ames, IA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; B05D / ;
U.S. Cl.
CPC ...
430311 ; 430326 ; 430330 ; 430165 ; 428901 ; 4271263 ; 427272 ;
Abstract
A method of making patterned metal oxide films on microelectronic wafer substrates. They are prepared by making a sol-gel of a metal oxide in combination with an ultraviolet light sensitive photo-active compound. The sol-gel is applied to a silicon wafer substrate, and the wafer subjected to a predetermined pattern of ultraviolet light to cause the photo-active compound to respond to the ultraviolet light. The wafer is thereafter aqueous alkali metal hydroxide washed to wash away the portions of the metal alkoxide film which have been exposed to UV light.