The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1992
Filed:
Jan. 07, 1991
Applicant:
Inventors:
Derryl D Allman, Colorado Springs, CO (US);
Brian R Lee, Colorado Springs, CO (US);
Assignee:
NCR Corporation, Dayton, OH (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 65 31 ; 106 16 ; 156646 ; 156652 ; 156656 ; 156657 ; 1566591 ; 1566611 ; 156663 ; 156904 ; 427 431 ; 430-5 ; 430270 ; 430318 ; 430323 ;
Abstract
There is disclosed a dyed, spin-on glass composition with a high carbon content for use in providing antireflective planarizing layers on substrates such as semiconductor silicon wafers. These layers can be used as hard masks by etching patterns therein. These hard masks can be used in multilayer resists and in making lithography masks. Methods for producing these hard-masks are also provided.
Allman, Derryl. (1992). Silica-based anti-reflective planarizing layer (U.S. Patent No. 5100503). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5100503
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile