The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 1992

Filed:

Aug. 07, 1989
Applicant:
Inventors:

Geert J Wijntjes, Chelsea, MA (US);

Michael Hercher, Marblehead, MA (US);

Assignee:

Optra, Inc., Beverly, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356356 ; 25023116 ; 2502 / ;
Abstract

A metrology system includes means for generating an interference fringe pattern as a function of a parameter to be measured, transducer apparatus for simultaneously generating three intensity-modulated optical signals, I.sub.R, I.sub.S and I.sub.T, that are related to the interference fringe pattern; signal processing apparatus for accurately determining an aspect of the interference fringe pattern from the three signals; means for accumulating phase information proportional to the aspect of the interference fringe pattern; and means for converting the accumulated phase and aspect information to desired outputs indicative of the parameter to be measured.


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Wijntjes, Geert. (1992). Meterology using interferometric measurement technology for measuring (U.S. Patent No. 5098190). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5098190

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