The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 1992

Filed:

Mar. 26, 1990
Applicant:
Inventors:

Teruo Kashino, Hino, JP;

Toshiyuki Yamagishi, Hino, JP;

Masakazu Andoh, Hino, JP;

Toshio Fujisaka, Hino, JP;

Assignee:

Konica Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F26B / ;
U.S. Cl.
CPC ...
34 18 ; 34 68 ; 34 41 ; 34155 ; 354300 ;
Abstract

The invention provides a photosensitive material processing apparatus having a processing part consisting of a plurality of processing tanks for processing a photosensitive and a drying part, disposed downstream of the processing part in a processing sequence, for drying the material. The drying part includes infrared drying system and hot air current drying system. There are provided a distinguishing circuit and a controlling circuit. The distinguishing circuit distinguishs the condition of the material either on a constant-drying-rate condition or on a decreasing-drying-rate condition on the basis of physical characteristics of the material. The controlling circuit controls the drying part so as to use the infrared drying system on the constant-drying-rate-condition or to use the hot air current drying system on the decreasing-drying-rate-condition on the basis of a distinguishing result of the distinguishing circuit.


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