The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1992
Filed:
Apr. 24, 1990
Applicant:
Inventors:
Gary Hillman, Livingston, NJ (US);
Robert D Mohondro, Pleasanton, CA (US);
Assignee:
Machine Technology, Inc., Parsippany, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05C / ;
U.S. Cl.
CPC ...
427240 ; 118 52 ; 118320 ; 118321 ; 427421 ; 437231 ;
Abstract
An apparatus and method is disclosed for applying a uniform layer of a fluid material such as photoresist onto the surface of a rotating workpiece such as a semiconductor wafer. A dispensing nozzle is provided with a rectangular or oblong shaped opening for painting a broad swath of the fluid material onto the surface of the workpiece while the nozzle moves along a radial path inwardly from the peripheral edge of the workpiece. The use of a rectangular or oblong shaped nozzle opening minimizes the amount of fluid material being consumed while providing a uniform thin film coating on the workpiece surface.