The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 1992
Filed:
Mar. 09, 1990
Masao Takashige, Himeji, JP;
Yuichi Ohki, Himeji, JP;
Takeo Hayashi, Himeji, JP;
Katsumi Utsuki, Himeji, JP;
Masahiro Fujimoto, Himeji, JP;
Idemitsu Petrochemical Co., Ltd., Tokyo, JP;
Abstract
The invention relates to processes for producing biaxially oriented single-layered and multilayered films. The biaxially oriented single-layered film receives stresses in the range of 500 kg/cm.sup.2 to 1500 kg/cm.sup.2 each in the machine and transverse directions of the film. The multilayered film receives stresses in the range of 300 kg/cm.sup.2 to 1250 kg/cm.sup.2 each in the machine and transverse directions of the film. Thus, the molding stability in biaxial orientation of a nylon film is improved and the thickness accuracy of a resulting film is improved.