The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 1992
Filed:
Sep. 27, 1990
Applicant:
Inventor:
Hideaki Kinoshita, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 17 ; 357 16 ; 357 55 ; 372 48 ; 372 46 ; 372 45 ; 372 43 ; 437126 ; 437130 ; 359130 ;
Abstract
A semiconductor device is disclosed in which an area pattern is formed on a portion of a major surface of a semiconductor substrate over which epitaxial growth layers are formed. In this case, compound semiconductor areas formed by an epitaxial growth method, by the utilization of a surface temperature difference between the major surface of the semiconductor surface and the area pattern in a heating process. By so doing, it is possible to simultaneously obtain the compound semiconductors of a different composition or a different energy gap from each other.