The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 1992
Filed:
Jul. 02, 1990
Juro Inomata, Mizusawa, JP;
Masaru Nakamura, Kitakami, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A gas in a process chamber, such as a sputtering chamber, having a typical inside pressure of 10.sup.-1 to 10.sup.-3 Torr, is analyzed by a mass spectrometer, which should be used at a pressure range of lower than around 10.sup.-4 Torr. The method comprises evacuating a process chamber by a vacuum pump and supplying a gas to the process chamber, whereby a pressure in the process chamber is determined by the vacuum pump and the supplied gas, and that pressure in the process chamber is higher than a pressure in the vacuum pump, and analyzing the gas at a portion of or around the vacuum pump, which portion has a pressure lower than the pressure in the process chamber, by using a mass spectrometer.