The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 1992
Filed:
Sep. 14, 1990
Roger P Holmstrom, Wayland, MA (US);
Edmund Meland, Chelmsford, MA (US);
F David Crawford, Melrose, MA (US);
GTE Laboratories Incorporated, Waltham, MA (US);
Abstract
A semiconductor mesa structure is covered with a photoresist material in a localized flooding manner such that the photoresist material is thinner on the top of the mesas and also at the upper most portion of the sidewalls than at the base of the mesa and the intervening channel. The photoresist is then exposed through a mask in a manner so that when developed, the photoresist from the mesa top and upper most portion of the sidewall can be removed. When the photoresist is exposed to the actinic radiaction, the thinner photoresist is adequately exposed more rapidly than the thicker portion nearer the bottom of the mesa, if the mask does not adequately shield the actinic radiation from reaching it. Thus the alignment tolerance is greater than if the photoresist were of uniform thickness.