The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1992
Filed:
May. 23, 1991
Applicant:
Inventor:
Syuichi Mitsutsuka, Tokyo, JP;
Assignee:
Clarion Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
3103 / ; 3103 / ;
Abstract
An SAW convolver having a piezoelectric film / insulating layer / low impurity concentration Si epitaxial layer / high impurity concentration Si epitaxial layer structure is disclosed, in which the low impurity concentration Si epitaxial layer is replaced by a GaAs epitaxial layer. In this way, it is possible to improve concentration characteristics with respect to those obtained by the prior art structure described above and it is unnecessary to control the thickness of the epitaxial layer so strictly as for the prior art structure.