The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 1992
Filed:
Dec. 01, 1989
Abstract
A novel polyethynylacetylene derivative represented by the formula ##STR1## wherein R is H, (C1-7) alkyl, phenyl, benzyl, naphthyl, carbazole, (C2-7) vinyl-alkyl --CX.sub.1 X.sub.2 (OH) or --SiX.sub.1 X.sub.2 X.sub.3 in which X.sub.1, X.sub.2 and X.sub.3 are H, (C1-7) alkyl, phenyl or benzyl, with the proviso that the case where all of X.sub.1, X.sub.2 and X.sub.3 are H is excluded and x is a number of 20 to 500. The polyethynylacetylene derivative is prepared by polymerizing a monomer of the formula HC.tbd.C--C.tbd.CR wherein R is as defined above, with the proviso that the case where R is H is excluded, in the presence of a metathesis catalyst or a Ziegler catalyst. A polyethynylacetylene derivative of the above formula (wherein R=H) is prepared by reacting a polyethynylacetylene derivative of the above formula wherein R=Si(C.sub.n H.sub.2n+1).sub.3 with a desilylating agent. The polyethynylacetylene derivative is soluble in organic solvents and can be shaped into various articles. This polymer is used as a high-sensitivity pattern-forming material and is promising as a precursor for polyacene polymers.