The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 1992

Filed:

Sep. 21, 1989
Applicant:
Inventors:

Masamichi Maruta, Kawagoe, JP;

Akihiro Fukui, Kamifukuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C87D / ;
U.S. Cl.
CPC ...
548521 ; 548452 ; 548520 ;
Abstract

The invention provides novel fluorine-containing bismaleimides represented by the general formula shown below. The bismaleimides are obtained by dehydrating and cyclizing reaction of corresponding bismaleamic acids which are also novel compounds. For example, maleic anhydride is used for preparing the bismaleamic acids. A mixture of a bismaleimide of the invention and a diamine is useful as a thermosetting resin composition. At 100.degree.-300.degree. C. the resin composition undergoes addition polymerization to turn into a solid resin which are high in moisture resistance and low in dielectric constant. For use in the resin composition it is preferable that both R.sup.1 and R.sup.2 in the general formula of the bismaleimide are --CF.sub.3. ##STR1## wherein A represents a divalent organic group having an ethylenic unsaturated bond; Rf represents fluorine atom or a perfluoroalkyl group; R.sup.1 and R.sup.2 are the same or different and each represent hydrogen atom, methyl group, ethyl group or a halogenated methyl group; and each -N< is at the m- or p-position with respect to the aromatic ether bond --O--.


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