The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 1992
Filed:
Sep. 22, 1988
Masahiro Abe, Tokyo, JP;
Kazuhisa Okada, Tokyo, JP;
Shuzo Fukuda, Tokyo, JP;
Yasushi Tanaka, Tokyo, JP;
Masayuki Yamato, Tokyo, JP;
Yoshikazu Takada, Tokyo, JP;
NKK Corporation, Tokyo, JP;
Abstract
The present invention relates to a method for producing high silicon steel strip in a continuous treatment line through chemical vapor deposition (called 'CVD' hereinafter), wherein the steel strip is subjected continuously to siliconization at temperatures between 1023.degree. and 1200.degree. C. by CVD in a non-oxidizing gas atmosphere containing SiCl.sub.4 between 5% and 35% in molar fraction. Subsequently a diffusion treatment is performed in a non-oxidizing gas atmosphere not containing SICl.sub.4 for diffusing Si uniformly throughout the steel strip, which is then cooled and coiled. If required, the steel strip may be coated with an insolating film and subjected to a baking treatment, before cooling and coiling.