The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 1992

Filed:

Oct. 24, 1989
Applicant:
Inventors:

Hitoshi Fujimoto, Itami, JP;

Hisao Masuda, Itami, JP;

Shuichi Osaka, Itami, JP;

Noriaki Uwagawa, Kikuchi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437209 ; 437210 ; 437220 ; 148D / ; 361421 ; 428620 ;
Abstract

With a method of and an apparatus for manufacturing semiconductor devices using copper-type lead frames with no silver plating, semiconductor devices are continuously manufactured in the following steps: first, a semiconductor pellet having electrodes on its surface is bonded, through a resin material, to a die pad on a copper-alloy lead frame which is not silver-plated. The resin material used for the bonding is then cured by heating it for 120 seconds or less in a non-oxidizing-gas atmosphere having an oxygen density of 1000 ppm or less. Then, the thickness of the oxide film which is formed on the surface of the lead frame while curing the resin material is reduced to 20 .ANG. or less by keeping the lead frame in a deoxidizing-gas atmosphere having an oxygen density of 500 ppm or less. Afterwards, wire-bonding is effected between the electrodes of the semiconductor pellet and the inner leads of the lead frame in 12 seconds or less in a deoxidizing-gas atmosphere while keeping the oxygen density around the surface of the lead frame at 3000 ppm or less.


Find Patent Forward Citations

Loading…