The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 1992
Filed:
Mar. 23, 1990
Koichi Moriizumi, Itami, JP;
Abstract
An electron beam exposure method incorporating a proximity effect correction for a pattern including large-area drawing patterns and small-area drawing patterns. The method includes dividing each large-area drawing pattern into a plurality of unit patterns and calculating the optimum electron beam exposure for each unit pattern and for each small-area drawing pattern. The calculation includes a proximity effect correction for each unit pattern and each small-area drawing pattern adjacent unit patterns having the same calculated exposures are merged into larger areas and drawing data based on the merged unit patterns, the unit patterns not merged, and the small-area drawing patterns is generated. The pattern is exposed to an electron beam that is controlled in accordance with the drawing data.