The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 1992
Filed:
Apr. 14, 1989
Minolu Soraoka, Kudamatsu, JP;
Yoshinao Kawasaki, Yamaguchi, JP;
Katsuyoshi Kudo, Kudamatsu, JP;
Tsunehiko Tsubone, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
The present invention relates to a plasma treating method and apparatus therefor, the plasma treating method comprising the steps of supplying a liquid refrigerant whose temperature is not higher than 0.degree. C. into a specimen table having a specimen place surface, cooling a specimen placed on the specimen place surface, treating the cooled specimen utilizing a gas plasma, and recovering the liquid refrigerant, in its liquid state, retained in the specimen table from the specimen table. The plasma treating apparatus comprised means for producing a gas plasma, a specimen table on which is placed a specimen to be treated utilizing the gas plasma and interiorly formed with a space for retaining a liquid refrigerant whose temperature is not higher than 0.degree. C., means for supplying the liquid refrigerant to the space, and means for recovering the liquid refrigerant, in its liquid state, to the liquid refrirant supplying means, whereby an increase in consumption quantity of the liquid refrigerant can be suppressed, and thus an increase in operating cost of the apparatus can be suppressed.