The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 1992
Filed:
Mar. 15, 1990
Umesh K Mishra, Cary, NC (US);
Robert J Trew, Cary, NC (US);
North Carolina State University at Raleigh, Raleigh, NC (US);
Abstract
The gate voltage breakdown of an integrated circuit field effect transistor, especially a compound semiconductor metal semiconductor field effect transistor (MESFET) and high electron mobility transistor (HEMT) is dramatically increased by forming an electron trap layer on the surface of the device, under the gate contact and extending beyond the gate contact towards the drain contact. The electron trap layer is preferably a high resisitivity lattice matched monocrystalline layer having at least 10.sup.18 traps per cubic centimeter. For gallium arsenide based transistors, the electron trap layer is preferably formed by low temperature molecular beam epitaxy (MBE) of gallium and arsenic fluxes, to produce a monocrystalline gallium arsenide layer having 1% excess arsenic. For indium phosphide based transistors, the electron trap layer is preferably formed by low temperature MBE of aluminum, indium and arsenic fluxes to produce a monocrystalline aluminum indium arsenide layer having 1% excess arsenic.