The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 1992
Filed:
Jan. 04, 1991
George Siddons, Elkhart, IN (US);
Frank W Wogoman, Granger, IN (US);
Miles Inc., Elkhart, IN (US);
Abstract
A method and structure are provided for controlled deposition of liquid analytical reagents on one or more reagent zones disposed in a reaction channel used for performing analytical assay procedures and the like. The substrate surface on which the reaction channel is defined is provided with a unique surface geometry wherein each reagent zone is defined in the form of a sharp, substantially flat, raised portion or mesa-shaped node. The raised node provides a discontinuity in the surface of the reaction channel which is sufficient to prevent a liquid reagent deposited thereon from spreading to adjacent surfaces and, thereby, provides a discrete or localized area to serve as a reagent zone. Controlled deposition is realized since drops of deposited reagent are prevented from spreading uncontrollably over the surrounding substrate surface while, at the same time, allowing the deposited reagent to be completely contacted and removed by the action of a liquid reaction mixture washing the reagent zone. An analytical reagent is incorporated in each such mesa-shaped reagent zone by applying a liquid form of the reagent to the mesa in a controlled manner and subsequently evaporating the liquid portion thereof so as to deposit a dry form of the reagent thereupon.