The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 1992

Filed:

Sep. 04, 1990
Applicant:
Inventors:

Monroe J Hordon, Pittsford, NY (US);

Lawrence E Kowalczyk, Penfield, NY (US);

Assignee:

Xerox Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 69 ; 75340 ; 420579 ; 420580 ; 427250 ; 4272557 ; 427294 ; 427404 ;
Abstract

Disclosed is an alloying process which comprises, in the order stated (1) heating in a reaction vessel a mixture of selenium and tellurium from ambient temperature to form about 270.degree. C. to about 330.degree. C. while maintaining the mixture in a quiescent state; (2) maintaining the mixture at from about 270.degree. C. to about 330.degree. C. until the entire mixture has reached substantial equilibrium with respect to temperature while maintaining the mixture in a quiescent state; (3) subsequently heating the mixture from the range of from about 270.degree. C. to about 330.degree. C. to the range of from about 500.degree. C. to about 580.degree. C. while maintaining the mixture in a quiescent state; (4) maintaining the mixture at from about 500.degree. C. to about 580.degree. C. until the entire mixture has reached substantial equilibrium with respect to temperature while maintaining the mixture in a quiescent state; (5) thereafter maintaining the mixture at from about 500.degree. C. to about 580.degree. C. for from about 0.75 hour to about 1.5 hours while vigorously agitating the mixture; (6) subsequent to agitation, reducing the temperature of the mixture from the range of from about 500.degree. C. to about 580.degree. C. to the range of from about 425.degree. C. to about 450.degree. C. while maintaining the mixture in a quiescent state; (7) subsequently maintaining the temperature of the mixture at from about 425.degree. C. to about 450.degree. C. for from about 4 hours to about 7 hours while maintaining the mixture in a quiescent state; (8) reducing the temperature of the mixture from the range of from about 425.degree. C. to about 450.degree. C. to the range of from about 290.degree. C. to about 350.degree. C. while maintaining the mixture in a quiescent state; and (9) removing the mixture from the reaction vessel. Also disclosed is a process for preparing an imaging member which comprises preparing a selenium-tellurium alloy by the above process and vacuum evaporating the alloy onto a substrate.


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