The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1992
Filed:
Apr. 11, 1990
William J Nowak, Webster, NY (US);
John H Hinton, Ontario, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
Polygon scanners of the type used in ROS printers, are subject to centrifugal caused distortion at the mirror (facet) surface at certain rotational speeds. This distortion can affect the performance of the scanning beam at an image plane. Techniques are provided for predicting the radial facet distortion at expected rotational speeds, and for specific polygon designs. In one embodiment, the surfaces of the polygon facets are modified to incorporate the reverse of the radial distortion curve which is predicted at the rotational load. When operating at the rotational load, the facet surface then deforms to a desired planar (flat) configuration. In another embodiment, the polygon element structure is modified by adjusting the polygon modules of elasticity, weight density, and the polygon continuum to achieve a distorted facet surface at rotational speed which provides the functions normally provided by a post polygon lens.