The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1992
Filed:
Mar. 28, 1990
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
Disclosed is a focusing ion beam apparatus, comprising an ion source, focusing and deflecting means for focusing and deflecting an ion beam obtained by the ion source, and a plurality of gas introducing means for a plurality of gases to be supplied onto the surface of a sample to deposit an insulating film. According to the apparatus, a silicon compound gas and a gas mainly consisting of an element other than silicon as a plurality of the gases are supplied onto the surface of the sample, then the ion beam obtained from the ion source is irradiated onto the gases. Thereby, the gases are decomposed so that an insulating film consisting of a silicon oxide or a silicon nitride is deposited on a desired oxide or a silicon nitride is deposited on a desired position of the surface of the sample.