The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1992
Filed:
Dec. 14, 1989
Applicant:
Inventors:
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429803 ; 2041921 ; 20419213 ; 20429807 ; 20429809 ; 20429802 ;
Abstract
A sputtering apparatus to be used in reactive sputtering which mixes a reactive gas into a discharge gas so as to form chemical compound thin membranes. A heating means is provided for heating the target. Light such as infrared rays or the like, and laser beams are ideal as the heating means. A thermometer for applying light is preferable to measure the temperature of at least one portion of the target for controlling the heating condition of the target. The composition of the thin membrane to be formed by the reactive sputtering can may be made constant.