The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1992
Filed:
Aug. 16, 1990
Robert A Oklejas, Monroe, MI (US);
Eli Oklejas, Jr, Monroe, MI (US);
Other;
Abstract
The invention is a centrifugal pump having an outer housing defining a pumping chamber. An impeller is rotatably positioned in the chamber for pumping a fluid. The impeller is mounted on the first end of a rotatable shaft. A journal bearing is positioned in the outer housing and disposed coaxially around the shaft. A small clearance space is present between the shaft and the journal bearing. The clearance space is in communication with the chamber whereby the fluid being pumped by the impeller is directed to said clearance space and the fluid provides the lubrication for the journal bearing. The impeller of the pump is moveable in the pumping chamber and positioned adjacent a first wall of the pumping chamber. An inverted tub is secured to the second end of the shaft and extends over a portion of the outer housing where the shaft is located. A drive belt engages the outer periphery of the inverted hub to rotate the inverted hub and impeller. The drive belt engages the inverted hub at substantially the midpoint of the journal bearing. A space is provided between the impeller and the second wall of the pumping chamber. The fluid being pumped enters the space and acts upon the impeller to bias the impeller towards the first wall. A groove is positioned in the first wall adjacent the impeller. A conduit extends from the groove to the discharge region for the pumped fluid whereby high pressure fluid from the discharge enters the groove to counteract the pressure from the space and the impeller is maintained in the desired position in the pumping chamber.