The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 1992
Filed:
Nov. 27, 1989
John J Kester, Midland, MI (US);
Michael J Mullins, Midland, MI (US);
The Dow Chemical Company, Midland, MI (US);
Abstract
The present invention describes a polymeric nonlinear optical (NLO) material in which NLO active groups are integral to the polymer chain and a process for producing the NLO material. The polymeric NLO material has recurring monomeric units of the following formula: ##STR1## where X is a divalent electron-donating group, Ar is a conjugating group, A is a divalent electron-withdrawing group and n is an integer of at least 3. The NLO material may be, for example, a poly(benzene sulphonamide) or a poly(p-benzamide). The polymeric material is prepared by applying a stress to the NLO polymer to induce orientation of the NLO active groups in the polymer such that the material exhibits nonlinear optical capabilities.