The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 1992
Filed:
Apr. 06, 1989
Dominic P Calamito, Hermosa Beach, CA (US);
Richard H Pusch, Huntington Beach, CA (US);
HITCO, Gardena, CA (US);
Abstract
An integrally woven multi-apertured multi-ply angle interlock fabric is woven so as to have a plurality of apertures which extend across the width of the fabric and are completely contained within the thickness of the fabric. The fabric is comprised of a first yarn system in which yarns extending across the width of the fabric in parallel, spaced-apart fashion form a laminate of spaced-apart, generally parallel yarn layers between the opposite top and bottom surfaces. The fabric is also comprised of a second yarn system having weaver yarns arranged into yarn layers which repeatedly extend through portions of the thickness of the fabric between the top and bottom surfaces and which interweave with a plurality of the yarn layers of the frist yarn system on one side of and one or more yarn layers of the first yarn system on the other side of the plurality of apertures being formed within the thickness of the fabric.