The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 1992

Filed:

Apr. 11, 1991
Applicant:
Inventors:

Satoru Tanaka, Saitama, JP;

Yasushi Murata, Saitama, JP;

Fumio Matsui, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J / ;
U.S. Cl.
CPC ...
2504611 ;
Abstract

An optical characteristic adjusting apparatus for a laser beam radiation system comprises a transparent substrate which generates visible radiation in response to non-visible radiation, and a stand for positioning the substrate perpendicular to an optical axis of laser beam emitted from a laser beam radiation system. When the non-visible radiation irradiates the surface of the substrate, a bright spot is formed since the visible radiation is generated from the irradiated portion of the substrate. Therefore, an operator can appropriately adjust the optical characteristics of the non-visible radiation at both sides of the transparent substrate since the bright spot can be observed at both sides of the transparent substrate.


Find Patent Forward Citations

Tanaka, Satoru. (1992). Optical characteristic adjusting apparatus (U.S. Patent No. 5079429). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5079429

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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