The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1992
Filed:
Apr. 30, 1990
Th. Goldschmidt AG, Essen, DE;
Abstract
A method and apparatus are disclosed for achieving and maintaining an inert atmosphere as oxygen-deficient as possible in a treatment chamber, having a reaction zone, particularly an irradiation chamber, traversed by a length of material, wherein the length of material is supplied to the chamber through an inlet channel and conducted from the chamber through an outlet channel. A circulating inert gas stream, which detaches the entrained gas boundary layer held by the material, is moved countercurrently to the length of material in the inlet channel and is supplemented in a controlled manner with fresh inert gas in such amount that a given maximum oxygen concentration is not exceeded in the reaction zone and the flow rate of the inert gas stream is controlled, so that the pressure before the exit gap of the outlet channel is the same or slightly higher than the surrounding pressure.