The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1992
Filed:
Apr. 16, 1990
Ichirou Yamaguchi, Wako, JP;
Tadakatsu Shimada, Fukaya, JP;
Kazuo Koya, Gunma, JP;
Toshiyuki Suzuki, Yokohama, JP;
Rikagaku Kenkyusho, Saitama, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Determination of refractive index distribution is utilized, including data of all the positions of diffraction images on a plane, from the incident ray dispersed by the cylindrical glass rod when the ray passes therethrough. A linear approximation thereof is performed; and the angle of the outgoing ray is calculated using the intersection of the approximate lineation and a plane through which the incident ray passes. Much data can be employed to calculated the angle of the outgoing ray. This substantially improves the accuracy of measurement of the angle of the outgoing ray and further this makes it possible to determine the angle even if no image of the outgoing ray is present on the plane throgh which the incident ray passes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile