The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 1992
Filed:
Mar. 12, 1991
Applicant:
Inventors:
William E Hoke, Wayland, MA (US);
Noren Pan, Nashua, NH (US);
James R Carter, North Grafton, MA (US);
Assignee:
Raytheon Company, Lexington, MA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
29 2501 ; 118715 ; 118720 ; 118725 ; 118730 ; 156610 ;
Abstract
A metalorganic chemical vapor deposition (MOCVD) reactor vessel is provided for the growth of Group II-VI, Group III-V, or Group IV layers particularly for use in thin heterostructure devices. The reactor vessel includes a chamber having a top surface substantially parallel to a semiconductor substrate disposed within the chamber and an inlet through which a vapor stream is directed. The chamber further includes a plate having a plurality of apertures disposed therethrough and a block disposed adjacent to the plate, to increase the uniformity and decrease the turbulence of the vapor stream.