The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 1991
Filed:
Feb. 06, 1991
Minoru Murayama, Kyoto, JP;
Kazuhiko Ito, Kyoto, JP;
Takeji Hashimoto, Kyoto, JP;
Masayuki Tokuda, Kyoto, JP;
Abstract
Plural images and plural register marks are printed on a photosensitive material with an original plate including an original image and register marks. Two kinds of masks are prepared before the printing: a photocomposing mask for masking the original image and the register marks on the original plate, and an exposing-out mask for masking the images and the register marks on the photosensitive material. First, the plural images and the register marks are printed on the photosensitive material while overlaying the original plate with the photocomposing mask by a photocomposer. Secondly, the photosensitive material is exposed with the exposing-out mask overlaid. Even if the plural images complementary are to each other, the total procedure can be performed easily while using the two masks. The two masks can be fabricated easily on the basis of the shape of the original image and of the positions and orientations of the plural images on the photosensitive material.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile