The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 1991
Filed:
Nov. 06, 1990
Narito Shibaike, Hirakata, JP;
Soichiro Mima, Nishinomiya, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
An ink recording apparatus used with printers or the like and manufactured by applying semiconductor device manufacturing techniques. One wall of an ink chamber is formed of a single-crystal substrate and an ink jet port is formed by etching on the single-crystal substrate. A slider and electrodes composed of polycrystalline-silicon film are formed on the single-crystal substrate by film forming in the LPCVD method and patterning through plasma etching. The slider has a plurality of ink passing holes which have respectively different diameter, being driven by electrostatic attracting force produced between voltage-applied electrodes and the slider. The electrodes are formed at positions corresonding to those where the each ink passing hole is aligned with the ink jet port.