The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 1991

Filed:

Mar. 28, 1990
Applicant:
Inventors:

Vincent Desobry, Marly, CH;

Kurt Dietliker, Fribourg, CH;

Rinaldo Husler, Marly, CH;

Werner Rutsch, Fribourg, CH;

Manfred Rembold, Aesch, CH;

Franciszek Sitek, Therwil, CH;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ; C07C / ; C07D / ;
U.S. Cl.
CPC ...
544 87 ; 522 34 ; 522 36 ; 522 39 ; 522 96 ; 522 81 ; 522107 ; 522109 ; 522121 ; 544163 ; 544171 ; 544175 ; 544130 ; 544141 ; 544121 ; 544137 ; 558405 ; 560 38 ; 564342 ;
Abstract

Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.


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