The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1991
Filed:
Aug. 10, 1989
Hisao Ohba, Shizuoka, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method of and an apparatus for developing with a developer a photosensitive lithographic plate on which images have been exposed while transporting the photosensitive lithographic plate with one surface thereof facing roughly downwards. In the method and the apparatus, while the photosensitive lithographic plate coated with the developer is being transported in a transport path which accommodates a portion of the developer and which is curved in a downward projecting manner, the photosensitive lithographic plate is dipped in the accommodated developer and, at the same time, the development of the layers of the photosensitive lithographic plate is accelerated by rubbing them. Moreover, the developer in the transport path is replenished with the developer which has been applied to the photosensitive lithographic plate. Accordingly, it is not necessary to provide a developer replenishing device in the transport path.