The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1991
Filed:
Sep. 20, 1990
John E Greivenkamp, Jr, Rochester, NY (US);
Russell J Palum, Rochester, NY (US);
Kevin G Sullivan, Ft. Myers, FL (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
Method and apparatus are disclosed for providing absolute Moire distance measurements of a diffusely reflective surface from a reference position. More particularly, a first grating is located, formed, or printed on the diffusely reflective surface. An image of the first grating is formed on a second grating or detector array by imaging means for generating a Moire pattern that is detected by a detector means. At the reference position of the diffusely reflective surface relative to the imaging means, the periods of the image of the first grating and the second grating match. Movement of the diffusely reflective surface from the reference position in a direction normal thereto, produces a spatially varying intensity pattern at the detector means which results from the shifting and magnification mismatch between the pattern of the image of the first grating and the pattern of the second grating. Measuring the amount of magnification differences between the two patterns provides information related to the instantaneous absolute distance of the diffusely reflective surface from the reference position. Various methods are disclosed for using the information from the detector means for determining the absolute distance measurements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile