The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1991
Filed:
Feb. 27, 1990
Alfred Renner, Muntelier, CH;
Christian Vonlanthen, Ependes, CH;
Edward Irving, Higher Whitley, GB;
Christopher P Banks, Saffron Walden, GB;
Ciba-Geigy Corporation, Ardsley, NY (US);
Abstract
Imides of the formula I ##STR1## In which R.sub.1, R.sub.2 and R.sub.4 independently of one another are hydrogen or methyl, R.sub.3 is a direct bond or a C.sub.2 -C.sub.20 aliphatic radical which can be interrupted by O atoms or a mononuclear or polynuclear C.sub.5 -C.sub.20 cycloaliphatic or C.sub.6 -C.sub.20 aromatic radical or is a group of the formula II ##STR2## in which T is methylene, isopropylidene, CO, O, S or SO.sub.2 and R.sub.5 is hydrogen or phenyl, can be crosslinked either photochemically or by heat and produce polymers having excellent properties, in particular a very high resistance to heat. They are particularly suitable for the production of heat-resistant photolithographs or as matrix resins for the production of composite materials.