The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1991
Filed:
Apr. 17, 1990
Applicant:
Inventors:
Yomiyuki Yama, Hyogo, JP;
Masatoshi Yasunaga, Hyogo, JP;
Katsuyoshi Mitsui, Hyogo, JP;
Ikuo Ogoh, Hyogo, JP;
Assignee:
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 20 ; 437 52 ; 437 34 ; 437229 ; 437931 ;
Abstract
A conductive resist film is used as a mask in ion implantation. A portion of the conductive resist film is electrically connected to a semiconductor substrate. The charge of ions which enter the conductive resist film in ion implantation flows into the semiconductor substrate and dissipates therein.