The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 1991
Filed:
Jan. 12, 1989
James E Boone, Baton Rouge, LA (US);
Douglas M Richards, Houston, TX (US);
Joseph A Bossier, III, Greenwell Springs, LA (US);
Ethyl Corporation, Richmond, VA (US);
Abstract
A process for continuously preparing silane and a coproduct by reacting a metal hydride such as NaAlH.sub.4 with a silicon halide such as SiF.sub.4, utilizing, in conducting the reaction, equipment which includes, in series, a primary reactor, a secondary reactor and a separation zone. The metal hydride is reacted in the first reactor with less than a stoichiometric amount of the silicon halide, and the unreacted metal hydride is then passed to the second reactor wherein the remainder of the hydride is reacted in the secondary reactor, in which a stoichiometric excess of the silicon halide is added. The rate of silicon halide or metal hydride addition is governed by a temperature differential feed back from the reaction in the secondary reactor so that overall a stoichiometric or substantially stoichiometric operation is achieved. Techniques are also disclosed for splitting the silicon halide feed between the liquid and vapor phases of the secondary reactor to eliminate the hazard of combustible mixtures, and, with variable speed agitation of the liquid, to control the mass transfer characteristics of the reaction. Also, consistant kinetics result from control of residence time by varying the liquid level in the secondary reactor as related to the halide or hydride mass flow rates. These improvements conserve resources, provides improved coproduct and reduce costs.