The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 1991
Filed:
Apr. 04, 1990
Applicant:
Inventor:
Andrew Weder, Highland, IL (US);
Assignee:
Highland Supply Corporation, Highland, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41G / ;
U.S. Cl.
CPC ...
2206 ; 156227 ; 264339 ;
Abstract
A method for forming a mask to be placed over at least a portion of an individual's face wherein a plurality of overlapping folds are formed in the sheet of material while the sheet of material is formed into the mask shape, the overlapping fold cooperating to maintain the sheet of material in the formed, predetermined mask shape.
Weder, Andrew. (1991). Mask adapted to be placed over at least a portion of an individual's face (U.S. Patent No. 5072460). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5072460
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile