The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 1991
Filed:
Feb. 13, 1991
Applicant:
Inventors:
Robert D Allen, San Jose, CA (US);
William D Hinsberg, III, Fremont, CA (US);
Logan L Simpson, Austin, TX (US);
Gregory M Wallraff, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430270 ; 430271 ; 430302 ; 430326 ; 430910 ; 522 31 ; 522 32 ; 522153 ;
Abstract
A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.
Allen, Robert. (1991). Liquid apply, aqueous processable photoresist compositions (U.S. Patent No. 5071730). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5071730
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile