The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 1991
Filed:
Feb. 20, 1990
Applicant:
Inventors:
Assignee:
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha, Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
B32B / ; B32B / ; B05D / ;
U.S. Cl.
CPC ...
428216 ; 4284111 ; 428432 ; 428442 ; 4284735 ; 428469 ; 428329 ; 428463 ; 4274301 ; 4274343 ;
Abstract
A multi-layer resist comprising (A) a layer of a Langmuir-Blodgett film, (B) a layer of at least one thin film and (C) a substrate, said layer (B) being placed between said layer, (A) and said substrate (C). The multi-layer resists of the invention are applicable to ultra fine processing on the order of submicron, half-micron or quarter-micron, and the number of defects can be remarkably decreased.