The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1991
Filed:
Aug. 08, 1989
Tetsuya Matsui, Hitachi, JP;
Takehiko Kitamori, Ushiku, JP;
Kenji Yokose, Hitachi, JP;
Masaharu Sakagami, Katsuta, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Apparatus for measuring breakdown plasma, comprising an irradiating device for irradiating a sample with a focused light beam and for causing breakdown of a ultrafine particle to be measured in the sample at the focused beam region to change the particle into plasma; a pair of electrodes arranged on opposite sides of the focused region of the beam; and a device for measuring an electrical resistance between the electrodes under a condition where the breakdown plasma is produced between the electrodes and for determining a diameter of the particle according to the measured electrical resistance serves for accurate measurement of the diameter of the ultrafine particle in the sample.