The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1991
Filed:
Mar. 13, 1990
Eiji Suzuki, Mizusawa, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A spin coating apparatus having a rotatable supporting disk for supporting a non-circular substrate thereon and an annular member having an inward overhanging inner wall, being coaxially fixed to the peripheral portion of the disk so as to surround the substrate. The height of the annular member is selected so that the top surface of the substrate is recessed from the top end portion of the annular member by a predetermined depth. The apparatus is suitable for coating a liquid photoresist film over a non-circular substrate, and providing the film with an acceptable uniform thickness over the entire film in spite of turbulent air flow which is caused adjacent to the substrate by the side walls of the non-circular substrate.